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Doctoral Thesis
DOI
10.11606/T.43.1981.tde-26022014-150737
Document
Author
Full name
Marilia Junqueira Caldas
Institute/School/College
Knowledge Area
Date of Defense
Published
São Paulo, 1981
Supervisor
Committee
Leite, Jose Roberto (President)
Brescansin, Luiz Marco
Pimentel, Cecilia de Alvarenga Freire
Qualifik, Paul
Title in Portuguese
Teoria de níveis profundos em silício
Keywords in Portuguese
Estrutura eletrônica
Abstract in Portuguese
Estudamos neste trabalho a estrutura eletrônica de defeitos localizados em silício, responsáveis pela introdução de níveis profundos na faixa proibida do semicondutor. Utilizamos para tanto modelos de aglomerados moleculares dentro do formalismo do Espalhamento Múltiplo com aproximação local X para o potencial de troca (MS-X). Um tratamento adequado para os orbitais de superfície foi usado. Os defeitos estudados foram de dois tipos: defeitos simples (monovacância Si:V e oxigênio substitucional Si:O) e pares de defeitos vizinhos na rede (divacância Si : V IND 2) e par de átomos de fósforo Si: P IND 2). Os defeitos foram estudados em diferentes estados de carga (Si:O e Si : O POT -', Si: P IND 2 e Si: P IND 2 POT + Si: V POT 0 IND 2, Si: V IND 2 POT + e Si: V POT IND 2) e no caso da divacância e do centro P IND 2 POT + foram incluídos efeitos de polarização de spin. Encontramos para todos os defeitos estudados indícios da ocorrência de efeitos Jahn-Teller. Incluímos análises das distorções dos primeiros vizinhos ao defeito nos sistemas Si: O POT , P IND 2 POT + e V POT IND 2. O modelo adotado mostrou-se capaz de descrever satisfatoriamente a estrutura eletrônica dos defeitos estudados, fornecendo resultados quantitativos que podem ser comparados diretamente com a experiência.
Title in English
Theory Deep Levels Silicon
Keywords in English
Electronic structure
Abstract in English
In this work we studied the electronic structure of deep-level defects in silicon. To do this we use molecular cluster models within the formalism of the Multiple Scattering method, in the local density functional approximation (X). The surface orbitals of the cluster are treated in a convenient way. The defects studied here were of two kinds: simple defects (single vacancy Si:V and oxygen substitutional Si:0), and pairs of defects occupying neighbouring sites in the lattice (divacancy Si :V2 and the pair of phosphoru- atoms Si :P2 ). The defects were studied in different charge states (Si:O and Si:O-, Si:P2 and Si:P+, Si:V20, SI:V2-) and for the divacancy and the center Si:P2+ the calculations were carried out to the spin-polarized limit. For all defects studied we found evidence as to the possible occurrence of Jahn-Teller effects. Analysis of nearest-neighbours distortions were included for the systems Si:O- , Si:V2+ and Si:V2-. The electronic structure of the defects studied here was satisfactorily described by the model we adopted, and quantitative results are given, that can be compared straightforwardly with experimental results.
 
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Publishing Date
2014-02-27
 
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