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Master's Dissertation
DOI
https://doi.org/10.11606/D.54.1983.tde-12052014-161504
Document
Author
Full name
Jeremias Francisco de Araujo
Institute/School/College
Knowledge Area
Date of Defense
Published
São Carlos, 1983
Supervisor
Committee
Castro Neto, Jarbas Caiado de (President)
Aegerter, Michel Andre
Morato, Spero Penha
Title in Portuguese
Ótica e tecnologia de filmes finos
Keywords in Portuguese
Filmes finos
Filtros
Óptica
Abstract in Portuguese
O objetivo deste trabalho é desenvolver a tecnologia de produção de filmes finos de precisão, de materiais dielétricos e/ou metálicos sobre componentes óticos de precisão. Para tal, cálculos computacionais de filmes finos foram desenvolvidos, tendo como finalidade projetarmos teoricamente qualquer tipo de camadas finas. As características dos filmes são mostradas graficamente ou em forma de tabela. A tecnologia de evaporação em alto vácuo de materiais tais como SiO2, Ti2O3, MgO, MgF2 e criolita (Na3AlF6), foi implantada no laboratório de filmes finos do DFCM. Alguns desses materiais, os óxidos, foram evaporados pioneiramente no Brasil neste trabalho. As camadas estudadas foram: Anti-refletoras com uma, duas e três camadas, espelhos de alta refletividade para lasers, filtros interferencial, filtros passa banda, separadores de feixes, etc. Tendo como ponto de partida os cálculos computacionais desenvolvidos e a tecnologia de evaporação implantada, algumas camadas de filmes finos de utilidade em ótica foram finalmente produzidas. A caracterização dos filmes finos por nós produzidos foi feita por medida da reflexão ou transmissão na região do infravermelho próximo, visível e ultravioleta, sendo para tal utilizado o espectrofotometro Cary 17. Estes espectros mostram boa concordância com os resultados teóricos obtidos.
Title in English
Optical and technology of thin films
Keywords in English
Optical filters
Optics
Thin films
Abstract in English
In this work we developed the technology of production of precision metallic and/or dielectric thin films evaporated on optical components. Numerical calculations of the characteristics of the films was developed allowing the knowledge of the reflectance spectra of the coatings before the evaporation, saving the cost of test by evaporation. The high vacuum evaporation technique of materials like SiO2, Ti2O3, MgO, Al2SO3, MgF2, and criolite (Na3AlF6) was implanted in the thin film laboratory of the DFCM. Some of this materials was evaporated by the first time in Brazil in this work. The coatings studied was: Anti-reflecting coatings of one, two and three layers, high reflecting mirrors for lasers, band pass filter, high and low pass filters. Starting with the numerical calculations some of the most frequently used coating in optics was projected and finally produced in the laboratory. These films were characterized by the spectra of reflection obtained with the spectrometer Cary 17. The characteristics of the films produced agree very well with the calculations.
 
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Publishing Date
2014-05-13
 
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