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Master's Dissertation
DOI
10.11606/D.54.1985.tde-13022015-155857
Document
Author
Full name
Fernando Josepetti Fonseca
Institute/School/College
Knowledge Area
Date of Defense
Published
São Carlos, 1985
Supervisor
Committee
Campos, Milton Soares de (President)
Alvarez, Fernando
Castro Neto, Jarbas Caiado de
Title in Portuguese
Desenvolvimento de uma célula solar de silício para aplicações espaciais
Keywords in Portuguese
Não disponível
Abstract in Portuguese
Este trabalho teve como objetivo o desenvolvimento de um conjunto de processos para a fabricação de células solares de silício para utilização espacial, do tipo convencional. As células solares de silício monocristalino desenvolvidas neste trabalho possuem junção rasa, obtida por difusão de fósforo em substrato tipo-p (com resistividade de 1 ou 10 Ohm.cm), grades de contato de Ti/Pd/Ag e camada antirefletora de dióxido de titânio. Em células de 4cm2 foram obtidas eficiências de conversão de até 13,6% com fator de preenchimento de 0,77 em substratos de 1 Ohm.cm e 13% e 0,76 em substratos de 10 Ohm.cm. Células construídas com substratos de 10 Ohm.cm apresentaram melhor tolerância à danos de radiação que as de 1 Ohm.cm. São analisadas as influências da camada antirefletora, resistividade de substrato, geometria e técnicas de deposição da grade de contatos no desempenho elétrico das células
Title in English
Not available
Keywords in English
Not available
Abstract in English
The objective of this work was the study and the development of techniques for the fabrication of silicon solar cells, of conventional type, for space applications. The single-crystal silicon solar cells were fabricated on p-type substrates of 1 and 10 Ohm.cm resistivities by thermal diffusion of phosphorus from liquid source. The anti-reflective coatings were made from titanium dioxide obtained by reactive sputtering of a titanium target. A triple titanium-palladium-silver layer was utilized to prepare the contacts. Conversion efficiencies of up to 13.6% and fill factors of 0.77 were obtained in cells fabricated on 1 Ohm.cm substrates and efficiencies of 13% and fill factor of 0.76 were obtained in cells fabricated in 10 Ohm.cm substrates. Better radiation damage tolerance was observed in cells with 10 Ohm.cm substrates when compared with 1 Ohm.cm substrate cells. The inf1uences of the anti-reflective coatings, substrate resistivities, and contact grid geometry and grid deposition techniques on cell performance are analyzed
 
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Publishing Date
2015-02-19
 
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